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Abstract Covalent 2D magnets such as Cr₂Te₃, which feature self‐intercalated magnetic cations located between monolayers of transition‐metal dichalcogenide material, offer a unique platform for controlling magnetic order and spin texture, enabling new potential applications for spintronic devices. Here, it is demonstrated that the unconventional anomalous Hall effect (AHE) in Cr₂Te₃, characterized by additional humps and dips near the coercive field in AHE hysteresis, originates from an intrinsic mechanism dictated by the self‐intercalation. This mechanism is distinctly different from previously proposed mechanisms such as topological Hall effect, or two‐channel AHE arising from spatial inhomogeneities. Crucially, multiple Weyl‐like nodes emerge in the electronic band structure due to strong spin‐orbit coupling, whose positions relative to the Fermi level is sensitively modulated by the canting angles of the self‐intercalated Cr cations. These nodes contribute strongly to the Berry curvature and AHE conductivity. This component competes with the contribution from bands that are less affected by the self‐intercalation, resulting in a sign change in AHE with temperature and the emergence of additional humps and dips. The findings provide compelling evidence for the intrinsic origin of the unconventional AHE in Cr₂Te₃ and further establish self‐intercalation as a control knob for engineering AHE in complex magnets. 

Abstract Realizing van der Waals (vdW) epitaxy in the 1980s represents a breakthrough that circumvents the stringent lattice matching and processing compatibility requirements in conventional covalent heteroepitaxy. However, due to the weak vdW interactions, there is little control over film qualities by the substrate. Typically, discrete domains with a spread of misorientation angles are formed, limiting the applicability of vdW epitaxy. Here, the epitaxial growth of monocrystalline, covalent Cr₅Te₈2D crystals on monolayer vdW WSe₂by chemical vapor deposition is reported, driven by interfacial dative bond formation. The lattice of Cr₅Te₈, with a lateral dimension of a few tens of micrometers, is fully commensurate with that of WSe₂via 3 × 3 (Cr₅Te₈)/7 × 7 (WSe₂) supercell matching, forming a single‐crystalline moiré superlattice. This work establishes a conceptually distinct paradigm of thin‐film epitaxy, termed “dative epitaxy”, which takes full advantage of covalent epitaxy with chemical bonding for fixing the atomic registry and crystal orientation, while circumventing its stringent lattice matching and processing compatibility requirements; conversely, it ensures the full flexibility of vdW epitaxy, while avoiding its poor orientation control. Cr₅Te₈2D crystals grown by dative epitaxy exhibit square magnetic hysteresis, suggesting minimized interfacial defects that can serve as pinning sites.